Area‐Selective Atomic Layer Deposition on Functionalized Graphene Prepared by Reversible Laser Oxidation (Adv. Mater. Interfaces 29/2022)
Source abstract
Abstract
Area-Selective Atomic Layer Deposition In article number 2201110, Kamila Mentel, Maarit Karppinen, Mika Pettersson, and co-workers used laser-induced oxidation of graphene as a surface activation tool, that guided atomic layer deposition to the pre-defined regions. This procedure allows to deposit metal oxide on graphene without pattern placement errors, therefore, it is expected to enable improved fabrication of graphene-based electronic devices.
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Research context
OpenAlex topics: Semiconductor materials and devices
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Affiliations
Department of Chemistry Nanoscience Center University of Jyväskylä Jyväskylä FI‐40014 Finland
Department of Chemistry and Materials Science School of Chemical Engineering Aalto University Aalto Espoo FI‐00076 Finland
Department of Physics Nanoscience Center University of Jyväskylä Jyväskylä FI‐40014 Finland
References
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