3‐D Nanofabrication of Silicon and Nanostructure Fine‐Tuning via Helium Ion Implantation (Adv. Mater. Interfaces 10/2022)
Source abstract
Abstract
Fine-Tuning of Nanostructures via Helium Ion Implantation In article number 2101643, Xiaolei Wen, Renwei Mao, and Huan Hu invent an approach for producing 3D silicon nanostructures with super small roughness based on substrate swelling caused by implantation of focused helium ion beams. Furthermore, mimicking the leaning tower of Pisa, they implant on the bottom of the readily made nanostructures to fine-tune the distance into sub 5-nm as well as the tilting angles.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Advanced Surface Polishing Techniques
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Affiliations
Center for Micro and Nanoscale Research and Fabrication University of Science and Technology of China 433 Huangshan RD Hefei Anhui Province 230026 China
ZJUI Institute Zhejiang University 718 East Haizhou Rd Haining 314400 China
State Key Laboratory of Fluid Power & Mechatronic Systems Zhejiang University Hangzhou 310027 China
School of Micro‐Nano Electronics Zhejiang University Hangzhou 310027 China
Hangzhou Global Scientific and Technology Innovation Center Hangzhou 310027 China
References
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