Chemical Vapor Deposition: An Eco‐Friendly, CMOS‐Compatible Transfer Process for Large‐Scale CVD‐Graphene (Adv. Mater. Interfaces 13/2019)
Source abstract
Abstract
In article number 1900084, Ji-Yun Moon, Dongmok Whang, Hak Ki Yu, Jae-Hyun Lee, and co-workers demonstrate a clean transfer method for large scale chemical vapor deposition (CVD) graphene using MoO3 as a protective film, which can be dissolved in pure DI water, easily and completely. The authors believe that this approach provides new solutions to overcome the limitations of the conventional transfer methods for CVD graphene and pave the way for future transfer method for CMOS manufacturing processes.
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Research context
OpenAlex topics: Additive Manufacturing and 3D Printing Technologies · Graphene research and applications
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Affiliations
Department of Energy Systems Research and Department of Materials Science and Engineering Ajou University Suwon Gyeonggi‐do 16499 Korea
National Graphene Institute University of Manchester Manchester M13 9PL UK
SKKU Advanced Institute of Nanotechnology School of Advanced Material Science and Engineering Sungkyunkwan University (SKKU) Suwon Gyeonggi‐do 16419 Korea
References
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