Regular Section on Deposition Technologies

Advanced Materials Interfaces is in its third year and more popular than ever. We are proud to publish high-level work related to interface technologies and effects presenting an interdisciplinary blend of physics, chemistry, materials science, and life sciences. We receive many papers on deposition methods such as Chemical Vapor Deposition (CVD), Atomic Layer Deposition (ALD), and related techniques, important tools in much work in these areas, and as a result we are launching in this issue a regular section concentrating on these techniques. Francis Maury (ENSIACET, Toulouse) will serve as the Chairman and be supported by an international Advisory Board for this section and we also welcome the following Board members who will support our work. We hope you enjoy reading this new section and the rest of the issue! The editorial team would be happy to receive any input and comments on the journal at advmatinterfaces@wiley.com With highest regards, Editorial Board Advanced Materials Interfaces: CVD-Section Francis Maury, CIRIMAT, France (Chairman) Mikko Ritala, University of Helsinki, Finland Michel Pons, SIMaP, France Anjana Devi, Ruhr-Universität Bochum, Germany Martyn Pemble, University College Cork, Ireland Graziella Malandrino, Università Degli Studi di Catania, Italy Yukihiro Shimogaki, University of Tokyo, Japan Shi-Woo Rhee, Pohang University of Science and Technology, Korea Augustín R. González-Elipe, Spanish National Research Council, Spain Michael Hitchman, University of Strathclyde, UK Raymond Adomaitis, University of Maryland Energy Research Center, USA Aleksander Wrobel, Polskiej Akademii Nauk, Poland PS. We would also like to point you to an earlier publication in Advanced Materials Interfaces, namely Karen Gleason's Review on CVD polymerization, A Route Towards Sustainability Through Engineered Polymeric Interfaces: http://onlinelibrary.wiley.com/doi/10.1002/admi.201400117/abstract.