Atomic Layer Deposition: 2D Transition Metal Dichalcogenide Thin Films Obtained by Chemical Gas Phase Deposition Techniques (Adv. Mater. Interfaces 3/2019)
Source abstract
Abstract
Ultrathin 2D transition metal dichalcogenide (TMD) thin films have attracted much attention due to their very good electrical, optical, and electrochemical properties. Here, the recent progress in 2D TMD thin films is reviewed and the current applications of these materials fabricated by chemical vapor deposition and atomic layer deposition are surveyed. More details are in article number 1800688 by Gyu-Hyeon Park, Kornelius Nielsch, and Andy Thomas.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: 2D Materials and Applications · Advanced biosensing and bioanalysis techniques · Chalcogenide Semiconductor Thin Films
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Affiliations
Leibniz Institute for Solid State and Materials Research (IFW) Dresden 01069 Dresden Germany
Institute of Materials Science Technische Universität Dresden 01062 Dresden Germany
References
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