journal article·2017-09Open access

Hot Wire ALD: Hot‐Wire Assisted ALD: A Study Powered by In Situ Spectroscopic Ellipsometry (Adv. Mater. Interfaces 18/2017)

Alexey Y. Kovalgin, Mengdi Yang, Sourish Banerjee, Ramazan O. Apaydin, Antonius A. I. Aarnink, Sachin Kinge, Rob A. M. Wolters

Advanced Materials Interfaces· Volume 4· Issue 18

Abstract

The cover depicts a reactor utilized for hot-wire assisted atomic layer deposition (Hot Wire ALD), enabling formation of reactive species (radicals) at low substrate temperatures, without the use of plasma. A tungsten filament heated up to1300–2000 °C is installed on the side. The reactor is equipped with an in situ spectroscopic ellipsometer, as reported by Alexey Y. Kovalgin and co-workers in article number 1700058.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Catalytic Processes in Materials Science

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Affiliations

MESA+ Institute for Nanotechnology University of Twente P. O. Box 217 7500 AE Enschede The Netherlands

Toyota Motor Europe/Advanced Techonolgy Division Hoge Wei 33 Zaventem 1930 Belgium

References

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