Vertically Standing Graphene: Heater‐Free and Substrate‐Independent Growth of Vertically Standing Graphene Using A High‐Flux Plasma‐Enhanced Chemical Vapor Deposition (Adv. Mater. Interfaces 18/2020)
Source abstract
Abstract
In article number 2000854, Yonglong Shen, Guosheng Shao, and co-workers propose a large-area deposition of structurally tuned vertically standing graphene (VSG) using a scalable high-flux plasma enhanced chemical vapor deposition (HPECVD) system. The generated energetic electrons in high-flux plasma boost the reaction kinetics of the growth process at low substrate temperature, enabling a unique growing mechanism.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Graphene research and applications · Graphene and Nanomaterials Applications · Diamond and Carbon-based Materials Research
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Affiliations
State Center for International Cooperation on Designer Low‐Carbon and Environmental Materials (CDLCEM) School of Materials Science and Engineering Zhengzhou University 100 Kexue Avenue Zhengzhou 450001 China
Zhengzhou Materials Genome Institute (ZMGI) Building 2, Zhongyuanzhigu, Xingyang Zhengzhou 450100 China
Advanced Technology Institute (ATI) University of Surrey Guildford Surrey GU27XH UK
References
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