Thin Films: Atomic Layer Deposition for Sensitized Solar Cells: Recent Progress and Prospects (Adv. Mater. Interfaces 21/2016)
Source abstract
Abstract
Atomic layer deposition (ALD), a technique based on vapor-phase, enables the deposition of ultrathin and conformal films on a variety of substrates; particles, tubes, fibers, and faceted surfaces. The exceptional conformality of ALD films and molecular-level control in the thickness and composition have attracted a great interest to functionalize nanoscale surfaces recently. In particular, such abilities of ALD have been capable of engineering surfaces of each component of Sensitized Solar Cells for improving the performance and reliability. Gregory N. Parsons and co-workers describe recent advances in this field in progress report 1600354.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Quantum Dots Synthesis And Properties · Nanowire Synthesis and Applications
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Affiliations
Chemical and Biomolecular Engineering North Carolina State University 911 Partners Way, Engineering Building I Raleigh NC 27606 USA
School of Materials Science and Engineering Georgia Institute of Technology 771 Ferst Drive NW, J. Erskine Love Building Atlanta GA 30332‐0245 USA
Chemical and Biological Engineering University of Alabama Box 870203 Tuscaloosa AL 35487‐0203 USA
References
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