journal article·2017-11

Atomic Layer Deposition of Zinc Glutarate Thin Films

Leo D. Salmi, Miika Mattinen, Teemu Niemi, Mikko J. Heikkilä, Kenichiro Mizohata, Sanna Korhonen, Sami‐Pekka Hirvonen, Jyrki Räisänen, Mikko Ritala

Advanced Materials Interfaces· Volume 4· Issue 22
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Abstract

Abstract Deposition of zinc glutarate thin films by atomic layer deposition is studied at 200–250 °C using zinc acetate and glutaric acid as the precursors. The films are characterized by UV–vis spectrophotometry, X‐ray diffraction, Fourier transform infrared spectroscopy, field emission scanning electron microscopy, energy‐dispersive X‐ray spectroscopy, atomic force microscopy, and time‐of‐flight elastic recoil detection analysis. According to X‐ray diffraction, the films deposited at 200 °C are crystalline with a crystal structure matching to zinc glutarate. The elastic recoil detection analysis shows that the composition of the films is a close match to zinc glutarate. Catalytic activity of the films is demonstrated using the copolymerization reaction of propylene oxide and CO2.
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Research context

OpenAlex topics: Carbon dioxide utilization in catalysis · Catalytic Processes in Materials Science · Advanced Photocatalysis Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Chemistry University of Helsinki P.O. Box 55 00014 Helsinki Finland

Department of Physics University of Helsinki P.O. Box 43 00014 Helsinki Finland

Funding

Academy of Finland

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