Annealing Temperature Effect on the Physical Properties of NiO Thin Films Grown by DC Magnetron Sputtering (Adv. Mater. Interfaces 9/2024)
Source abstract
Abstract
Nickel Oxide Thin Films In article 2300815, Yakov Enns and co-workers produce thin films of nickel oxide (NiO) by magnetron sputtering. The modification of the properties of NiO films by annealing at various temperatures and environments is reported. The difference in the effect of film annealing depending on the modes of their initial growth is shown.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Transition Metal Oxide Nanomaterials
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Affiliations
Alferov University Saint‐Petersburg 194021 Russia
Ioffe Institute Saint‐Petersburg 194021 Russia
Peter the Great St.Petersburg Polytechnic University Saint‐Petersburg 195251 Russia
Research Park Saint Petersburg State University Saint Petersburg 199034 Russia
Center for Photonics and 2D Materials Moscow Institute of Physics and Technology Dolgoprudny 141700 Russia
Faculty of Physics Moscow State University Moscow 119991 Russia
Institute of Telecommunications Riga Technical University Riga 1048 Latvia
References
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