journal article·2018-07Open access

Free‐Standing Bialkali Photocathodes Using Atomically Thin Substrates

Hisato Yamaguchi, Fangze Liu, Jeffrey DeFazio, Mengjia Gaowei, Claudia W. Narvaez Villarrubia, Junqi Xie, John Sinsheimer, Derek Strom, Vitaly Pavlenko, Kevin L. Jensen, John Smedley, Aditya D. Mohite, Nathan A. Moody

Advanced Materials Interfaces· Volume 5· Issue 13

Abstract

Abstract This study reports successful deposition of high quantum efficiency (QE) bialkali antimonide K2CsSb photocathodes on graphene films. The results pave the way for an ultimate goal of encapsulating technologically relevant photocathodes for accelerator technology with an atomically thin protecting layer to enhance lifetime while minimizing QE losses. A QE of 17% at ≈3.1 eV (405 nm) is the highest value reported so far on graphene substrates and is comparable to that obtained on stainless steel and nickel reference substrates. The spectral responses of the photocathodes on graphene exhibit signature features of K2CsSb including the characteristic absorption at ≈2.5 eV. Materials characterization based on X‐ray fluorescence and X‐ray diffraction reveals that the composition and crystal quality of these photocathodes deposited on graphene is comparable to those deposited on a reference substrate. Quantitative agreement between optical calculations and QE measurements for the K2CsSb on free suspended graphene and a graphene‐coated metal substrate further confirms the high‐quality interface between the photocathodes and graphene. Finally, a correlation between the QE and graphene quality as characterized by Raman spectroscopy suggests that a lower density of atomistic defects in the graphene films leads to higher QE of the deposited K2CsSb photocathodes.
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Research context

OpenAlex topics: Topological Materials and Phenomena · Quantum and electron transport phenomena · Radiation Detection and Scintillator Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

MPA‐11 Materials Synthesis and Integrated Devices (MSID) Materials Physics and Applications Division Mail Stop: K763 Los Alamos National Laboratory P. O. Box 1663 Los Alamos NM 87545 USA

Photonis USA Pennsylvania Inc. 1000 New Holland Ave. Lancaster PA 17601 USA

Brookhaven National Laboratory P. O. Box 5000 Upton NY 11973 USA

Argonne National Laboratory 9700 South Cass Ave. Argonne IL 60439 USA

Max Planck Institute for Physics Föhringer Ring 6 D‐80805 Munich Germany

Accelerators and Electrodynamics (AOT‐AE) Accelerator Operations and Technology Division Mail Stop: H851 Los Alamos National Laboratory P. O. Box 1663 Los Alamos NM 87545 USA

Materials and Systems Branch (Code 6360) Materials Science and Technology Division Naval Research Laboratory Washington DC 20375 USA

Funding

Laboratory Directed Research and Development · Los Alamos National Laboratory · National Nuclear Security Administration · National Science Foundation · National Institutes of Health · U.S. Department of Energy

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