journal article·2025-11Open access

Dielectric Property of a Large‐Scale Transferred Single‐Crystal BaTiO 3 Film Prepared Using a Water‐Soluble Sacrificial Buffering Layer

Sou Yasuhara, Taisei Kikuchi, Tsukasa Katayama, Shintaro Yasui, Mitsuru Itoh, Takuya Hoshina

Advanced Materials Interfaces· Volume 12· Issue 22

Abstract

Abstract The process of transferring inorganic single crystal thin films by using a water‐soluble sacrificial layer, especially Sr 3 Al 2 O 6 , has attracted much attention for its potential application to flexible devices and to the investigation of the properties of thin films without strain originated from a substrate. However, single‐crystal thin films of BaTiO 3 , the best‐known dielectric material, are difficult to transfer. In this study, to prepare a large‐scale single‐crystal BaTiO 3 thin film, the mismatch strain between the objective film and a substrate is reduced by introducing a buffering layer. Sr 3 Al 2 O 6 with partial substitution of Sr to Ba is utilized as a water‐soluble sacrificial layer for the lattice matching to BaTiO 3 . A large‐scale transferred single‐crystal BaTiO 3 thin film succeeded in preparing of over 5 mm × 5 mm by using a sacrificial (Ba,Sr) 3 Al 2 O 6 layer. The high crystallinity of single‐crystal BaTiO 3 is maintained during the transfer process, and a very low dielectric loss (tan δ < 0.1) of the transferred BaTiO 3 is estimated. The dielectric constant ε r of the transferred BaTiO 3 film is lower than that of BaTiO 3 /SrRuO 3 /(100)SrTiO 3 and almost the same as that of the c axis of BaTiO 3 single crystal with a low tan δ value of ≈0.1. These results suggest that reducing the mismatch strain by introducing a buffering layer of (Ba,Sr) 3 Al 2 O 6 is effective for the production of large‐scale transferred single‐crystal thin films.
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Research context

OpenAlex topics: Ferroelectric and Piezoelectric Materials · Microwave Dielectric Ceramics Synthesis · Dielectric materials and actuators

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Materials and Chemical Technology Institute of Science Tokyo 2‐12‐1 Ookayama, Meguro‐ku Tokyo 152‐8550 Japan

Research Institute for Electronic Science Hokkaido University Kita 20 Nishi 10, Kita‐ku Sapporo Hokkaido 001‐0020 Japan

Laboratory for Advanced Nuclear Energy Institute of Science Tokyo 2‐12‐1 Ookayama, Meguro‐ku Tokyo 152‐8550 Japan

Environmental Safety Center Institute of Science Tokyo 4259 Nagatsuta, Midori‐ku Yokohama Kanagawa 226‐8501 Japan

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