journal article·2002-10-02

Ultrafine and Well-Defined Patterns on Silicon Through Reaction Selectivity

K. Prabhakaran, H. Hibino, T. Ogino

Advanced Materials· Volume 14· Issue 19
Publisher page

Abstract

Surface atoms can have a different reactivity or affinity towards other atoms and molecules, depending on the differences in their physical locations. This phenomenon can result in selective conversion to a variety of ultrafine and well-defined functional units on the same material surface. It is shown that nitric oxide reacts with a silicon surface in the bifunctional mode of nitriding and etching, which results in the formation of ultrafine nitride linings around a pattern (see also cover).
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Research context

OpenAlex topics: Semiconductor materials and devices · Metal and Thin Film Mechanics · GaN-based semiconductor devices and materials

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