Metasurfaces: Continuous‐Gradient Plasmonic Nanostructures Fabricated by Evaporation on a Partially Exposed Rotating Substrate (Adv. Mater. 23/2016)

A continuous-gradient approach of material evaporation is employed by L. Shao, M. Käll, and co-workers to fabricate nanostructures with varying geometric parameters such as thickness, lateral positioning, and orientation on a single substrate. This method for mask lithography, described on page 4658, allows continuous tuning of the physical properties of a sample. The technique is highly valuable in simplifying the overall optimization process for constructing metasurfaces.