journal article·2012-06-19Open access

Template Patterning: Flexible Control of Block Copolymer Directed Self‐Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning (Adv. Mater. 23/2012)

He Yi, Xin‐Yu Bao, Jie Zhang, Christopher Bencher, Li‐Wen Chang, Xiangyu Chen, Richard Tiberio, James Conway, Huixiong Dai, Yongmei Chen, Subhasish Mitra, H.‐S. Philip Wong

Advanced Materials· Volume 24· Issue 23

Abstract

The image depicts the flexible control over the directed self-assembly of block copolymers that can be achieved using small topographical templates. On page 3107, H.-S. P. Wong and co-workers explain how differently shaped templates cause the block copolymer to self-assemble to form corresponding nanopatterns, providing a potential solution to contact-hole patterning for integrated circuits beyond the 22 nm technology node.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Block Copolymer Self-Assembly · Nanofabrication and Lithography Techniques

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