Facile Photofabrication of Stable, Submicrometer‐Wide, Electrically Conductive Patterns
Source abstract
Abstract
A fabrication method for submicrometer‐wide electric conductive patterns using Ag nanoparticle/polymer composites on furan‐functionalized substrates (see Figure) is reported. A 180 nm wide (full width at half maximum) photofabricated pattern has been achieved, well below the wavelength of incident light. After annealing at 200 °C for 40 min, the pattern worked as an electric wire with a resistivity of ∼8 × 10–4 Ω cm.
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Research context
OpenAlex topics: Nanomaterials and Printing Technologies · Photonic Crystals and Applications · Nanofabrication and Lithography Techniques
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References (21)
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