Photopatterning: Mechanophotopatterning on a Photoresponsive Elastomer (Adv. Mater. 17/2011)

Mechanophotopatterning on a photoreversible covalent adaptable network allows complex topo-graphical features to be fabricated by performing sequential stretching and light exposure steps, report Christopher Kloxin and co-workers on p. 1977. In this image, the material was stretched and exposed to a square-array photomask, followed by a second exposure to a square-array photomask rotated 45°. The lens quality of this material is demonstrated when backlit by an LCD display.