Micellar Inorganic–Polymer Hybrid Systems—A Tool for Nanolithography
Source abstract
Abstract
A approach to nanolithography based on the self-assembly and formation of mono-micellar films of a diblock-copolymer is reported. The Figure shows the formation of islands using an inorganically modified micellar mask. Au3+ in the micelles leads to islands while the formation of a Au-nanoparticle in each single micelle results in holes, owing to an inversion of the etching rate.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Synthesis and properties of polymers · Silicone and Siloxane Chemistry · Nanofabrication and Lithography Techniques
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