Plasma induced chemical vapor deposition of Zr(C,B) from CpZr(BH4)3 (Cp C5H5⊖)
Source abstract
Abstract
The hardness of metal borides makes them suitable for applications as corrosion resistant and, in combination with other materials, as hard coatngs for cutting tools, for example. The plasma induced chemical vapor deposition of Zr(C,B) from the precursor CpZr(BH4)3, where Cp is C5H5⊖, is described and the results of an investigation of the dependence of the deposition rete and the film characteristics on the deposition parameters, e.g. the carrier gas and the substrate temperature, are presented.
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Diamond and Carbon-based Materials Research · Advanced materials and composites
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References (18)
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