Nanoscopic Templates from Oriented Block Copolymer Films
Source abstract
Abstract
Ordered nanoporous films have been generated via selective degradation of self-assembled block copolymer films of polystyrene (PS) and poly(methylmethacrylate) (PMMA), which contain oriented cylindrical microdomains. Deep UV irradiation degrades the PMMA, which can be rinsed away, leaving an ordered array of circular holes in a film of cross-linked PS (see Figure).
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Block Copolymer Self-Assembly · Nanomaterials for catalytic reactions
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References
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