Calix[4]resorcinarene Derivatives as High‐Resolution Resist Materials for Supercritical CO₂ Processing

Ultra-high-resolution lithography resists based on calix[4] resorcinarene derivatives are shown to be compatible with supercritica l CO2 processing upon the incorporation of specific functionali ties, as illustrated by the inset to the figure. The compounds show high glass-transition temperatures, excellent solubility in supercritical CO2, and good film forming properties, enabling the patterning of line/space features as small as 70 nm (depicted in the figure).