Aerosol‐assisted chemical vapor deposition (AACVD) of silver, palladium and metal alloy (Ag_1−xPd_x, Ag_1−xCu_x and Pd_1−xCu_x) Films

Thermally labile, low‐volatility molecules are usually unsuitable as precursors for the chemical vapor deposition of high‐quality metal films. Here, a new method, aerosol‐assisted CVD (see Fig.), is reported, and used to produce crystalline silver, palladium, and binary metal alloy thin films from just such precursors. magnified image