Reactively Sputter-Deposited Titanium Oxide Coatings with Parallel Penniform Microstructure
Source abstract
Abstract
Ordered titanium dioxide films with large and controllable microstructure have been prepared by a low temperature sputtering deposition method. The Figure displays the “parallel penniform” structure of the films, which have very large surface area and excellent contact to the underlying substrate, rendering them potentially important for electrochemical and photoelectrochemical applications.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: ZnO doping and properties · Metal and Thin Film Mechanics · Electrophoretic Deposition in Materials Science
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