journal article·2021-10Open access

The Role of Additives in Suppressing the Degradation of Liquid‐Exfoliated WS2 Monolayers

Leonhard Karger, Kevin Synnatschke, Simon Settele, Yvonne J. Hofstetter, Tim Nowack, Jana Zaumseil, Yana Vaynzof, Claudia Backes

Advanced Materials· Volume 33· Issue 42

Abstract

Abstract Group VI transition metal dichalcogenides (TMDs) are considered to be chemically widely inert, but recent reports point toward an oxidation of monolayered sheets in ambient conditions, due to defects. To date, the degradation of monolayered TMDs is only studied on individual, substrate‐supported nanosheets with varying defect type and concentration, strain, and in an inhomogeneous environment. Here, degradation kinetics of WS2 nanosheet ensembles in the liquid phase are investigated through photoluminescence measurements, which selectively probe the monolayers. Monolayer‐enriched WS2 dispersions are produced with varying lateral sizes in the two common surfactant stabilizers sodium cholate (SC) and sodium dodecyl sulfate (SDS). Well‐defined degradation kinetics are observed, which enable the determination of activation energies of the degradation and decouple photoinduced and thermal degradation. The thermal degradation is slower than the photoinduced degradation and requires higher activation energy. Using SC as surfactant, it is sufficiently suppressed. The photoinduced degradation can be widely prevented through chemical passivation achieved through the addition of cysteine which, on the one hand, coordinates to defects on the nanosheets and, on the other hand, stabilizes oxides on the surface, which shield the nanosheets from further degradation.
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Research context

OpenAlex topics: 2D Materials and Applications · Advanced Photocatalysis Techniques · MXene and MAX Phase Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Institute for Physical Chemistry Heidelberg University Im Neuenheimer Feld 253 69120 Heidelberg Germany

Integrated Center for Applied Photophysics and Photonic Materials TU Dresden Nöthnitzer Straße 61 01187 Dresden Germany

Center for Advancing Electronics Dresden (cfaed) TU Dresden Helmhotzstraße 18 01069 Dresden Germany

Centre for Advanced Materials Ruprecht‐Karls‐Universität Heidelberg Im Neuenheimer Feld 225 69120 Heidelberg Germany

Funding

Deutsche Forschungsgemeinschaft · European Research Council

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