journal article·2021-03Open access

Formation of Highly Doped Nanostripes in 2D Transition Metal Dichalcogenides via a Dislocation Climb Mechanism

Yung‐Chang Lin, Jeyakumar Karthikeyan, Yao‐Pang Chang, Shisheng Li, Silvan Kretschmer, Hannu‐Pekka Komsa, Po‐Wen Chiu, Arkady V. Krasheninnikov, Kazu Suenaga

Advanced Materials· Volume 33· Issue 12

Abstract

Abstract Doping of materials beyond the dopant solubility limit remains a challenge, especially when spatially nonuniform doping is required. In 2D materials with a high surface‐to‐volume ratio, such as transition metal dichalcogenides, various post‐synthesis approaches to doping have been demonstrated, but full control over spatial distribution of dopants remains a challenge. A post‐growth doping of single layers of WSe2 is performed by adding transition metal (TM) atoms in a two‐step process, which includes annealing followed by deposition of dopants together with Se or S. The Ti, V, Cr, and Fe impurities at W sites are identified by using transmission electron microscopy and electron energy loss spectroscopy. Remarkably, an extremely high density (6.4–15%) of various types of impurity atoms is achieved. The dopants are revealed to be largely confined within nanostripes embedded in the otherwise pristine WSe2. Density functional theory calculations show that the dislocations assist the incorporation of the dopant during their climb and give rise to stripes of TM dopant atoms. This work demonstrates a possible spatially controllable doping strategy to achieve the desired local electronic, magnetic, and optical properties in 2D materials.
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Research context

OpenAlex topics: 2D Materials and Applications · MXene and MAX Phase Materials · Advanced Photocatalysis Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Nanomaterials Research Institute National Institute of Advanced Industrial Science and Technology (AIST) Tsukuba 305‐8565 Japan

Department of Applied Physics Aalto University P. O. Box 11100 Aalto 00076 Finland

Department of Basic Sciences and Humanities Rajiv Gandhi Institute of Petroleum Technology Jais Amethi Uttar Pradesh 229304 India

Department of Electrical Engineering National Tsing Hua University Hsinchu 30013 Taiwan

International Center for Young Scientists (ICYS) National Institute for Materials Science (NIMS) Tsukuba 305‐0044 Japan

Institute of Ion Beam Physics and Materials Research Helmholtz‐Zentrum Dresden‐Rossendorf 01328 Dresden Germany

Microelectronics Research Unit University of Oulu P. O. Box 8000 Oulu 90014 Finland

Funding

Japan Society for the Promotion of Science · Academy of Finland · Deutsche Forschungsgemeinschaft · Technische Universität Dresden · Ministry of Science and Technology, Taiwan

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