Direct Patterning of Organic Functional Polymers through Conventional Photolithography and Noninvasive Cross‐Link Agents
Source abstract
Abstract
A new technique for direct patterning of functional organic polymers using commercial photolithography setups with a minimal loss of the materials' performances is reported. This result is achieved through novel cross-link agents made by boron- and fluorine-containing heterocycles that can react between themselves upon UV- and white-light exposure.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Organic Electronics and Photovoltaics · Photochromic and Fluorescence Chemistry
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
ISIS & icFRC University of Strasbourg & CNRS 8 Allée Gaspard Monge 67000 Strasbourg France
School of Chemistry and Chemical Engineering Shanghai Jiao Tong University Shanghai 200240 P. R. China
Center for Advancing Electronics Dresden (CFAED) and Department of Chemistry and Food Chemistry Technische Universität Dresden Mommsenstraße 4 01062 Dresden Germany
Funding
European Research Council
References (29)
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