Ultraflat Ternary Nanopatterns Fabricated Using Colloidal Lithography
Source abstract
Abstract
Colloidal lithography on mica has been combined with subsequent thermal evaporation, sputtering, and template-stripping processes to produce ultraflat ternary nanopatterns of large lateral extension (see Figure). The resulting surface is particularly useful for applications that demand proper distinction between complex surface chemistry and topography.
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Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Photonic Crystals and Applications · Force Microscopy Techniques and Applications
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References (20)
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