Generation of Chrome Masks with Micrometer-Scale Features Using Microlens Lithography

Periodic patterns with submicrometer features in a photoresist supported on glass have been generated using arrays of microlenses and macroscopic transparency-film photomasks. The Figure shows a pattern obtained with a mask in the shape of the letter “G”. Deposition of a chromium film, followed by lift-off, converts the photoresist pattern into a chrome mask for pattern transfer to other substrates by contact photolithography.