Selective Formation of Inverted Opals by Electron‐Beam Lithography

Lateral control of the fabrication of selectively inverted opals using polymer–silica composites is reported. Poly(methyl methacrylate)–SiO2 composite opals obtained by chemical vapor deposition can be patterned by electron-beam lithography and developed to produce silica inverse opals with well-defined extrinsic defects (see Figure).