journal article·2004-07-05Open access

Stamps for Submicrometer Soft Lithography Fabricated by Capillary Force Lithography

C. M. Bruinink, M. Péter, M. de Boer, L. Kuipers, J. Huskens, D. N. Reinhoudt

Advanced Materials· Volume 16· Issue 13

Abstract

A convenient, inexpensive technique for fabrication of stamps for submicrometer soft lithography from masters with micrometer-size features is presented. Templates fabricated by capillary-force lithography are robust against replica molding of stamps. The Figure shows the resulting metal structure after employing such a second-generation stamp in microcontact printing of octadecanethiol and subsequent wet chemical etching of the underlying gold.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Nanofabrication and Lithography Techniques · Force Microscopy Techniques and Applications · Advancements in Photolithography Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (32)

Show source-provided references
1. Handbook of Microlithography Micromachining and Microfabrication Vol. 1(Ed: P. Rai‐Choudhury) SPIE Optical Engineering Press Bellingham WA1997.
2. 10.1147/rd.411.000710.1147/rd.411.0007 ↗
3. 10.1109/3.76031510.1109/3.760315 ↗
4. 10.1116/1.58923110.1116/1.589231 ↗
5. 10.1116/1.58923210.1116/1.589232 ↗
6. 10.1016/0042-207X(92)90270-710.1016/0042-207X(92)90270-7 ↗
7. 10.1002/(SICI)1521-3773(19980316)37:5<550::AID-ANIE550>3.0.CO;2-G10.1002/(SICI)1521-3773(19980316)37:5<550::AID-ANIE550>3.0.CO;2-G ↗
8. 10.1146/annurev.matsci.28.1.15310.1146/annurev.matsci.28.1.153 ↗
9. 10.1126/science.272.5258.8510.1126/science.272.5258.85 ↗
10. 10.1002/1521-4095(200109)13:18<1386::AID-ADMA1386>3.0.CO;2-X10.1002/1521-4095(200109)13:18<1386::AID-ADMA1386>3.0.CO;2-X ↗
11. 10.1021/la960936e10.1021/la960936e ↗
12. 10.1021/la960387c10.1021/la960387c ↗
13. 10.1002/adma.1995007051310.1002/adma.19950070513 ↗
14. 10.1126/science.273.5273.34710.1126/science.273.5273.347 ↗
15. 10.1002/adma.1995007071010.1002/adma.19950070710 ↗
16. Lithographic molding for example combines the patterning of gold by microcontact printing (printing and selective wet chemical etching of the bare gold) followed by anisotropic wet etching of silicon in an alcoholic solution of KOH. The resulting V‐shaped structures in silicon function as high‐resolution masters for stamp fabrication.
17. 10.1002/1616-3028(20020618)12:6/7<405::AID-ADFM405>3.0.CO;2-110.1002/1616-3028(20020618)12:6/7<405::AID-ADFM405>3.0.CO;2-1 ↗
18. 10.1021/cm031024i10.1021/cm031024i ↗
19. http://www.zurich.ibm.com/st/microcontact/stamps/material.html
20. The application of the standard literature CFL procedure (i.e. no pre‐equilibration) reported by Lee and co‐workers [9] with regular PDMS stamps (18 h post‐curing > 5 mm thick) resulted in some cases in separation of the stamp from the polymer layer and consequently in only a small patterning area with symmetric PMMA edge structures.
21. 10.1021/cm00060a02310.1021/cm00060a023 ↗
22. 10.1063/1.11898810.1063/1.118988 ↗
23. 10.1021/ja020946410.1021/ja0209464 ↗
24. 10.1002/1521-4095(200104)13:8<604::AID-ADMA604>3.0.CO;2-J10.1002/1521-4095(200104)13:8<604::AID-ADMA604>3.0.CO;2-J ↗
25. 10.1038/2973010.1038/29730 ↗
26. 10.1063/1.12262110.1063/1.122621 ↗
27. 10.1021/jp980556x10.1021/jp980556x ↗
28. 10.1021/la980978y10.1021/la980978y ↗
29. 10.1063/1.128981610.1063/1.1289816 ↗
30. 10.1021/ma982034l10.1021/ma982034l ↗
31. 10.1021/ja017854j10.1021/ja017854j ↗
32. 10.1088/0960-1317/5/2/01510.1088/0960-1317/5/2/015 ↗