Directed 2D‐to‐3D Pattern Transfer Method for Controlled Fabrication of Topologically Complex 3D Features in Silicon
Source abstract
Abstract
A process that allows control over the 3D motion of catalyst nanostructures during metal-assisted chemical etching by their local pinning prior to etching is demonstrated. The pinning material acts as a fulcrum for rotation of the catalyst structures resulting in etching of silicon features with rotational geometry.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Silicon Nanostructures and Photoluminescence · Nanowire Synthesis and Applications · Force Microscopy Techniques and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (38)
Show source-provided references
1. Ito T. · Appl. Phys. Lett. · 2006 · 89 · 3
2. Koynov S. · Appl. Phys. Lett. · 2006 · 88 · 3
3. 10.1016/j.optmat.2004.08.00710.1016/j.optmat.2004.08.007 ↗
4. Ben Y. · 2005
5. 10.1021/j100065a00710.1021/j100065a007 ↗
6. 10.1126/science.278.5339.84010.1126/science.278.5339.840 ↗
7. 10.1002/adma.1997009100410.1002/adma.19970091004 ↗
8. Madou M. J. · 2002
9. 10.1002/adfm.20080037110.1002/adfm.200800371 ↗
10. 10.1021/nl903841a10.1021/nl903841a ↗
11. 10.1002/adma.20040168110.1002/adma.200401681 ↗
12. 10.1149/1.210934710.1149/1.2109347 ↗
13. 10.1016/j.electacta.2007.01.03510.1016/j.electacta.2007.01.035 ↗
14. 10.1021/nn901174e10.1021/nn901174e ↗
15. 10.1063/1.292431110.1063/1.2924311 ↗
16. 10.1016/S0022-0728(99)00189-810.1016/S0022-0728(99)00189-8 ↗
17. 10.1016/j.electacta.2008.03.00910.1016/j.electacta.2008.03.009 ↗
18. 10.1016/j.elecom.2006.10.04110.1016/j.elecom.2006.10.041 ↗
19. 10.1143/APEX.1.06700310.1143/APEX.1.067003 ↗
20. 10.1021/ja010367j10.1021/ja010367j ↗
21. 10.1063/1.180699210.1063/1.1806992 ↗
22. 10.1021/am100077310.1021/am1000773 ↗
23. 10.1063/1.131919110.1063/1.1319191 ↗
24. 10.1063/1.327579410.1063/1.3275794 ↗
25. 10.1063/1.243706510.1063/1.2437065 ↗
26. 10.1016/j.ultramic.2008.04.00610.1016/j.ultramic.2008.04.006 ↗
27. 10.1116/1.295572810.1116/1.2955728 ↗
28. 10.1016/S1386-9477(99)00249-010.1016/S1386-9477(99)00249-0 ↗
29. 10.1002/1521-4095(200105)13:10<756::AID-ADMA756>3.0.CO;2-F10.1002/1521-4095(200105)13:10<756::AID-ADMA756>3.0.CO;2-F ↗
30. 10.1038/3506552510.1038/35065525 ↗
31. 10.1002/adma.20040094010.1002/adma.200400940 ↗
32. 10.1063/1.216851610.1063/1.2168516 ↗
33. 10.1109/JMEMS.2009.202384110.1109/JMEMS.2009.2023841 ↗
34. 10.1109/JMEMS.2007.89671310.1109/JMEMS.2007.896713 ↗
35. 10.1002/adma.20080175910.1002/adma.200801759 ↗
36. 10.1063/1.217763910.1063/1.2177639 ↗
37. 10.1002/adma.20090441010.1002/adma.200904410 ↗
38. 10.1021/nl902217610.1021/nl9022176 ↗