Photoresist‐Free Lithographic Patterning of Solution‐Processed Nanostructured Metal Thin Films
Source abstract
Abstract
Nanostructured Ag thin films solution-deposited on glass and plastic substrates are patterned by direct exposure to a pulsed Nd:YAG laser without using a photoresist layer. Sharp-edged patterns with a feature size scaled down to ca. 2 µm are obtainable.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Nanomaterials and Printing Technologies · Fluid Dynamics and Thin Films
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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