Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography
Source abstract
Abstract
Electron beam lithography is a powerful technique for the production of nanostructures but pattern quality depends on numerous interacting process variables. Orthogonal gradients of resist composition, baking temperatures, and development time as well as dose variations inside writing fields are used to prepare ternary combinatorial libraries for an efficient stepwise optimization of a molecular glass negative tone resist system.
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Research context
OpenAlex topics: Advancements in Photolithography Techniques · Nanofabrication and Lithography Techniques · Integrated Circuits and Semiconductor Failure Analysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (30)
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