An Approach to Lithographically Defined Self‐Assembled Nanoparticle Films
Source abstract
Abstract
Lithographically defined nanoparticle films with high quality and excellent uniformity have been fabricated using a combination of bottom-up self-assembly and top-down interferometic lithography. Using this simple, fast, and versatile approach, various 1D and 2D mesoscopic patterns of silica nanoparticle films are easily fabricated over a large area with nanometer-scale periodicity (see figure).
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Photonic Crystals and Applications · Liquid Crystal Research Advancements · Photonic and Optical Devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (34)
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