journal article·2015-12Open access

Wettability Contrast Gravure Printing

Heng Zhang, Alexander Ramm, Sooman Lim, Wei Xie, Bok Yeop Ahn, WeiChao Xu, Ankit Mahajan, Wieslaw J. Suszynski, Chris Kim, Jennifer A. Lewis, C. Daniel Frisbie, Lorraine F. Francis

Advanced Materials· Volume 27· Issue 45

Abstract

Silicon gravure patterns are engineered to have cells that are wettable and lands that are not wettable by aqueous inks. This strategy allows excess ink on the lands to be removed without using a doctor blade. Using an aqueous silica ink, continuous lines as narrow as 1.2 μm with 1.5 μm space are gravure printed.
Source: europepmc · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Nanomaterials and Printing Technologies · Nanofabrication and Lithography Techniques · Photonic Crystals and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Chemical Engineering and Materials Science University of Minnesota 421 Washington Avenue S.E. Minneapolis MN 55455 USA

School of Engineering and Applied Sciences Wyss Institute for Biologically Inspired Engineering Harvard University Cambridge MA 02318 USA

Funding

Office of Naval Research

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