Deterministic Nanotexturing by Directional Photofluidization Lithography

Directional photofluidization lithography enables deterministic large-area nanotexturing of periodic surface reliefs with precisely controlled structural complexity. The proposed nanotexturing technique demonstrates a hidden potential of micro- and nanofabrication methods, which allows for manipulation of the photonic and interface properties of nanotextured surfaces. Detailed facts of importance to specialist readers are published as ”Supporting Information”. Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.