Magnetic Ceramic Films from a Metallopolymer Resist Using Reactive Ion Etching in a Secondary Magnetic Field

S. B. Clendenning; S. Han; N. Coombs; C. Paquet; M. S. Rayat; D. Grozea; P. M. Brodersen; R. N. S. Sodhi; C. M. Yip; Z.‐H. Lu; I. Manners

doi:10.1002/adma.200306262

journal article·2004-02-17

Magnetic Ceramic Films from a Metallopolymer Resist Using Reactive Ion Etching in a Secondary Magnetic Field

S. B. Clendenning, S. Han, N. Coombs, C. Paquet, M. S. Rayat, D. Grozea, P. M. Brodersen, R. N. S. Sodhi, C. M. Yip, Z.‐H. Lu, I. Manners

Advanced Materials· Volume 16· Issue 4

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Source abstract

Abstract

Magnetic ceramic films containing metal‐rich nanoworm reticulations 200–550 nm wide have been fabricated from a highly metallized metallopolymer resist (see Figure) using oxygen or hydrogen plasma reactive ion etching in a secondary magnetic field. Applications may be found in spintronics and logic circuits.

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Research context

Ceramics & glasses Nanomaterials

OpenAlex topics: Dielectric materials and actuators · Copper Interconnects and Reliability · Block Copolymer Self-Assembly

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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