Line Defects Embedded in Three‐Dimensional Photonic Crystals
Source abstract
Abstract
Conventional optical photolithography is used to create photoresist patterns on a preformed silica colloidal crystal film. Upon regrowth of the same silica colloidal crystal followed by removal of the photoresist patterns, air–core line defects are successfully introduced into the self-assembled silica colloidal crystal (see Figure and inside cover).
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Photonic Crystals and Applications · Photonic and Optical Devices · Mesoporous Materials and Catalysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (25)
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