Microstructuring of Molecularly Thin Polymer Layers by Photolithography
Source abstract
Abstract
Laterally structured ultrathin polymer films attached to solid surfaces can be obtained using photolithographic techniques developed for electronic device fabrication. The Figure shows a surface plasmon (SP) microscopy image of a structured polystyrene (PS) film of 21.5 nm thickness prepared by photopolymerization. The authors report a strong adhesion of the polymer films to the substrate due to covalent linking.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques
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