Novel Positive-Tone Chemically Amplified Resists with Photoacid Generator in the Polymer Chains
Source abstract
Abstract
The successful synthesis of a series of positive-tone chemically amplified (CA) resists, with photoacid generating units incorporated in the resist matrix, is reported. The resists are found to exhibit excellent film formation behavior and an extremely high sensitivity, which makes them potential candidates for low-voltage electron beam (EB) lithography (a typical pattern is shown in the Figure).
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Advancements in Photolithography Techniques · Nanofabrication and Lithography Techniques · Semiconductor materials and devices
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