Hot‐Pressing Metal Covalent Organic Frameworks as Personal Protection Films

Abstract Effective personal protection is crucial for controlling infectious disease spread. However, commonly used personal protective materials such as disposable masks lack antibacterial/antiviral function and may lead to cross infection. Herein, a polyethylene glycol‐assisted solvent‐free strategy is proposed to rapidly synthesize a series of the donor–acceptor metal‐covalent organic frameworks (MCOFs) (i.e., GZHMU‐2, JNM‐1, and JNM‐2) under air atmosphere and henceforth extend it via in situ hot‐pressing process to prepare MCOFs based films with photocatalytic disinfect ability. Best of them, the newly designed GZHMU‐2 has a wide absorption spectrum (200 to 1500 nm) and can efficiently produce reactive oxygen species under sunlight irradiation, achieving excellent photocatalytic disinfection performance. After in situ hot‐pressing as a film material, the obtained GZHMU‐2/NMF can effectively kill E. coli (99.99%), S. aureus (99%), and H1N1 (92.5%), meanwhile possessing good reusability. Noteworthy, the long‐term use of a GZHMU‐2/NWF‐based mask has verified no damage to the living body by measuring the expression of mouse blood routine, lung tissue, and inflammatory factors at the in‐vivo level.