journal article·2024-06Open access

Electrically Controlled All‐Antiferromagnetic Tunnel Junctions on Silicon with Large Room‐Temperature Magnetoresistance

Jiacheng Shi, Sevdenur Arpaci, Victor Lopez‐Dominguez, Vinod K. Sangwan, Farzad Mahfouzi, Jinwoong Kim, Jordan G. Athas, Mohammad Hamdi, Can Aygen, Hanu Arava, Charudatta Phatak, Mario Carpentieri, Jidong S. Jiang, Matthew A. Grayson, Nicholas Kioussis, Giovanni Finocchio, Mark C. Hersam, Pedram Khalili Amiri

Advanced Materials· Volume 36· Issue 24

Abstract

Abstract Antiferromagnetic (AFM) materials are a pathway to spintronic memory and computing devices with unprecedented speed, energy efficiency, and bit density. Realizing this potential requires AFM devices with simultaneous electrical writing and reading of information, which are also compatible with established silicon‐based manufacturing. Recent experiments have shown tunneling magnetoresistance (TMR) readout in epitaxial AFM tunnel junctions. However, these TMR structures are not grown using a silicon‐compatible deposition process, and controlling their AFM order required external magnetic fields. Here are shown three‐terminal AFM tunnel junctions based on the noncollinear antiferromagnet PtMn3, sputter‐deposited on silicon. The devices simultaneously exhibit electrical switching using electric currents, and electrical readout by a large room‐temperature TMR effect. First‐principles calculations explain the TMR in terms of the momentum‐resolved spin‐dependent tunneling conduction in tunnel junctions with noncollinear AFM electrodes.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Magnetic properties of thin films · Quantum and electron transport phenomena · Semiconductor materials and interfaces

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Electrical and Computer Engineering Northwestern University Evanston IL 60208 USA

Applied Physics Program Northwestern University Evanston IL 60208 USA

Institute of Advanced Materials (INAM) Universitat Jaume I Castellón 12006 Spain

Department of Materials Science and Engineering Northwestern University Evanston IL 60208 USA

Department of Physics and Astronomy California State University Northridge Northridge CA 91330 USA

Materials Science Division Argonne National Laboratory Lemont IL 60439 USA

Department of Electrical and Information Engineering Politecnico di Bari Bari 70125 Italy

Department of Mathematical and Computer Sciences Physical Sciences and Earth Sciences University of Messina Messina 98166 Italy

Department of Chemistry Northwestern University Evanston IL 60208 USA

Funding

U.S. Department of Energy · Office of Science · Basic Energy Sciences

References (58)

Show source-provided references
1. 10.1063/1.486246710.1063/1.4862467 ↗
2. 10.1126/sciadv.aar356610.1126/sciadv.aar3566 ↗
3. 10.1038/nnano.2016.1810.1038/nnano.2016.18 ↗
4. 10.1016/j.physleta.2018.01.00810.1016/j.physleta.2018.01.008 ↗
5. 10.1126/science.aab103110.1126/science.aab1031 ↗
6. 10.1103/PhysRevB.99.02440510.1103/PhysRevB.99.024405 ↗
7. 10.1063/5.003105310.1063/5.0031053 ↗
8. 10.1103/PhysRevApplied.11.02401910.1103/PhysRevApplied.11.024019 ↗
9. 10.1063/5.000944510.1063/5.0009445 ↗
10. 10.7567/APEX.11.03010110.7567/APEX.11.030101 ↗
11. 10.1103/PhysRevLett.118.05770110.1103/PhysRevLett.118.057701 ↗
12. 10.1038/s41467-018-07092-210.1038/s41467-018-07092-2 ↗
13. 10.1038/s41467-017-02780-x10.1038/s41467-017-02780-x ↗
14. 10.1103/PhysRevApplied.11.05403010.1103/PhysRevApplied.11.054030 ↗
15. 10.1038/s41928-020-0367-210.1038/s41928-020-0367-2 ↗
16. 10.1038/s41467-020-19511-410.1038/s41467-020-19511-4 ↗
17. 10.1038/s41467-021-24237-y10.1038/s41467-021-24237-y ↗
18. 10.1038/s41598-018-32508-w10.1038/s41598-018-32508-w ↗
19. 10.1103/PhysRevB.97.01441710.1103/PhysRevB.97.014417 ↗
20. 10.1021/acs.nanolett.0c0336710.1021/acs.nanolett.0c03367 ↗
21. 10.1103/PhysRevLett.124.02720210.1103/PhysRevLett.124.027202 ↗
22. 10.1038/s41586-020-2211-210.1038/s41586-020-2211-2 ↗
23. 10.1038/s41928-023-00975-310.1038/s41928-023-00975-3 ↗
24. 10.1103/PhysRevLett.123.22720310.1103/PhysRevLett.123.227203 ↗
25. 10.1103/PhysRevLett.123.24720610.1103/PhysRevLett.123.247206 ↗
26. 10.1038/nmat125610.1038/nmat1256 ↗
27. 10.1038/nmat125710.1038/nmat1257 ↗
28. 10.1103/PhysRevX.12.04050110.1103/PhysRevX.12.040501 ↗
29. 10.1103/PhysRevX.12.04000210.1103/PhysRevX.12.040002 ↗
30. 10.1038/s41467-021-26915-310.1038/s41467-021-26915-3 ↗
31. 10.1038/s41928-022-00744-810.1038/s41928-022-00744-8 ↗
32. 10.1103/PhysRevLett.128.19720110.1103/PhysRevLett.128.197201 ↗
33. 10.1038/s41586-022-05461-y10.1038/s41586-022-05461-y ↗
34. 10.1038/s41586-022-05463-w10.1038/s41586-022-05463-w ↗
35. 10.1038/s41928-018-0040-110.1038/s41928-018-0040-1 ↗
36. 10.1103/PhysRevLett.68.251210.1103/PhysRevLett.68.2512 ↗
37. 10.1063/1.170268210.1063/1.1702682 ↗
38. 10.1063/1.505216310.1063/1.5052163 ↗
39. 10.1103/PhysRevApplied.7.06402210.1103/PhysRevApplied.7.064022 ↗
40. 10.1038/nmat298310.1038/nmat2983 ↗
41. 10.1103/PhysRevLett.109.13720110.1103/PhysRevLett.109.137201 ↗
42. 10.1002/adfm.20140165910.1002/adfm.201401659 ↗
43. 10.1063/5.014621210.1063/5.0146212 ↗
44. 10.1143/JPSJ.72.261410.1143/JPSJ.72.2614 ↗
45. 10.1126/sciadv.aaz880910.1126/sciadv.aaz8809 ↗
46. 10.1109/TMAG.2008.200167810.1109/TMAG.2008.2001678 ↗
47. 10.1038/nnano.2014.9410.1038/nnano.2014.94 ↗
48. 10.1073/pnas.150747411210.1073/pnas.1507474112 ↗
49. 10.1038/nmat456610.1038/nmat4566 ↗
50. 10.1063/5.013518510.1063/5.0135185 ↗
51. 10.1038/s41467-021-24854-710.1038/s41467-021-24854-7 ↗
52. 10.1021/acs.nanolett.0c0064710.1021/acs.nanolett.0c00647 ↗
53. 10.1103/PhysRevApplied.18.03404610.1103/PhysRevApplied.18.034046 ↗
54. 10.1021/acs.nanolett.1c0478610.1021/acs.nanolett.1c04786 ↗
55. 10.1002/adfm.20211256110.1002/adfm.202112561 ↗
56. 10.1103/PhysRevApplied.17.03400410.1103/PhysRevApplied.17.034004 ↗
57. 10.1038/srep4370510.1038/srep43705 ↗
58. 10.1103/PhysRevB.98.10443010.1103/PhysRevB.98.104430 ↗