journal article·2022-02

Sodium‐Doped Titania Self‐Rectifying Memristors for Crossbar Array Neuromorphic Architectures

Sung‐Eun Kim, Jin‐Gyu Lee, Leo Ling, Stephanie E. Liu, Hyung‐Kyu Lim, Vinod K. Sangwan, Mark C. Hersam, Hong‐Sub Lee

Advanced Materials· Volume 34· Issue 6
Publisher page

Abstract

Abstract Memristors integrated into a crossbar‐array architecture (CAA) are promising candidates for nonvolatile memory elements in artificial neural networks. However, the relatively low reliability of memristors coupled with crosstalk and sneak currents in CAAs have limited the realization of the full potential of this technology. Here, high‐reliability Na‐doped TiO2 memristors grown in situ by atomic layer deposition (ALD) are demonstrated, where reversible Na migration underlies the resistive‐switching mechanism. By employing ALD growth with an aqueous NaOH reactant in deionized water, uniform implantation of Na dopants is achieved in the crystallized TiO2 thin films at 250 °C without post‐annealing. The resulting Na‐doped TiO2 memristors show electroforming‐free and self‐rectifying resistive‐switching behavior, and they are ideally suited for selectorless CAAs. Effective addressing of selectorless nodes is demonstrated via electrical measurement of individual memristors in a 6 × 6 crossbar using a read current of less than 1 µA with negligible sneak current at or below the noise level of ≈100 pA. Finally, the long‐term potentiation and depression synaptic behavior from these Na‐doped TiO2 memristors achieves greater than 99.1% accuracy for image‐recognition tasks using a convolutional neural network based on the selectorless of crossbar arrays.
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Research context

OpenAlex topics: Advanced Memory and Neural Computing · Neuroscience and Neural Engineering · Ferroelectric and Negative Capacitance Devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Materials Science and Engineering Kangwon National University 1 Kangwondaehak‐gil Chuncheon Gangwon 24341 Korea

Department of Electrical and Computer Engineering Northwestern University Evanston IL 60208 USA

Department of Materials Science and Engineering Northwestern University Evanston IL 60208 USA

Department of Chemical Engineering Interdisciplinary Program in Advanced Functional Materials and Devices Development Kangwon National University 1 Kangwondaehak‐gil Chuncheon Gangwon 24341 Korea

Department of Chemistry Northwestern University Evanston IL 60208 USA

Funding

National Research Foundation of Korea

References (70)

Show source-provided references
1. 10.1038/s41565-020-0647-z10.1038/s41565-020-0647-z ↗
2. 10.1038/nnano.2015.5610.1038/nnano.2015.56 ↗
3. 10.1038/nature2574710.1038/nature25747 ↗
4. 10.1002/adfm.20200368310.1002/adfm.202003683 ↗
5. 10.1021/acs.nanolett.1c0098210.1021/acs.nanolett.1c00982 ↗
6. 10.1063/1.88232410.1063/1.882324 ↗
7. 10.1126/science.276.5310.23810.1126/science.276.5310.238 ↗
8. 10.1016/j.apsusc.2006.08.04410.1016/j.apsusc.2006.08.044 ↗
9. 10.1103/PhysRevB.70.02441710.1103/PhysRevB.70.024417 ↗
10. 10.1016/S1369-7021(08)70119-610.1016/S1369-7021(08)70119-6 ↗
11. 10.1038/srep0170410.1038/srep01704 ↗
12. 10.1002/adma.20090037510.1002/adma.200900375 ↗
13. 10.1038/nnano.2012.24010.1038/nnano.2012.240 ↗
14. 10.1038/nature0894010.1038/nature08940 ↗
15. 10.1021/nl901874j10.1021/nl901874j ↗
16. 10.1021/nl904092h10.1021/nl904092h ↗
17. 10.1038/nature1444110.1038/nature14441 ↗
18. 10.1038/s41928-017-0002-z10.1038/s41928-017-0002-z ↗
19. 10.1038/s41928-019-0288-010.1038/s41928-019-0288-0 ↗
20. Manem H. · 2010 · 28710.1145/1785481.1785548 ↗
21. 10.1038/nnano.2009.45610.1038/nnano.2009.456 ↗
22. 10.1021/nn302877610.1021/nn3028776 ↗
23. 10.1016/j.mejo.2012.10.00110.1016/j.mejo.2012.10.001 ↗
24. 10.1002/adfm.20120217010.1002/adfm.201202170 ↗
25. 10.1039/C5NR00861A10.1039/C5NR00861A ↗
26. 10.1088/0022-3727/48/19/19510510.1088/0022-3727/48/19/195105 ↗
27. 10.1038/nmat274810.1038/nmat2748 ↗
28. 10.1002/adma.20160445710.1002/adma.201604457 ↗
29. 10.1016/j.apmt.2020.10084810.1016/j.apmt.2020.100848 ↗
30. 10.1038/s41467-021-23180-210.1038/s41467-021-23180-2 ↗
31. 10.1021/acs.nanolett.6b0178110.1021/acs.nanolett.6b01781 ↗
32. 10.1016/j.chaos.2020.11023610.1016/j.chaos.2020.110236 ↗
33. 10.1002/adfm.20130352010.1002/adfm.201303520 ↗
34. 10.1021/ja970862910.1021/ja9708629 ↗
35. 10.1039/D0NA00230E10.1039/D0NA00230E ↗
36. 10.1021/acs.chemmater.5b0234810.1021/acs.chemmater.5b02348 ↗
37. 10.1021/am508670z10.1021/am508670z ↗
38. 10.1016/j.nanoen.2017.11.07710.1016/j.nanoen.2017.11.077 ↗
39. 10.1021/acs.nanolett.6b0434710.1021/acs.nanolett.6b04347 ↗
40. 10.1002/adfm.20120069810.1002/adfm.201200698 ↗
41. 10.1016/j.jpowsour.2014.09.03410.1016/j.jpowsour.2014.09.034 ↗
42. 10.1007/s10853-010-5113-010.1007/s10853-010-5113-0 ↗
43. 10.1002/jrs.125007060610.1002/jrs.1250070606 ↗
44. 10.1088/0022-3727/33/8/30510.1088/0022-3727/33/8/305 ↗
45. 10.1088/0957-4484/24/29/29520210.1088/0957-4484/24/29/295202 ↗
46. 10.1016/j.elecom.2008.10.02010.1016/j.elecom.2008.10.020 ↗
47. 10.1016/j.ceramint.2020.06.05110.1016/j.ceramint.2020.06.051 ↗
48. 10.1039/ft994900102310.1039/ft9949001023 ↗
49. 10.1021/jacs.8b1068910.1021/jacs.8b10689 ↗
50. 10.1143/JJAP.51.09650310.1143/JJAP.51.096503 ↗
51. 10.1016/0368-2048(75)80052-110.1016/0368-2048(75)80052-1 ↗
52. 10.1016/S0368-2048(02)00041-510.1016/S0368-2048(02)00041-5 ↗
53. Seah M. P. · 1990
54. M. J.Frisch G. W.Trucks H. B.Schlegel G. E.Scuseria M. A.Robb J. R.Cheeseman G.Scalmani V.Barone G. A.Petersson H.Nakatsuji X.Li M.Caricato A. V.Marenich J.Bloino B. G.Janesko R.Gomperts B.Mennucci H. P.Hratchian J. V.Ortiz A. F.Izmaylov J. L.Sonnenberg D.Williams‐Young F.Ding F.Lipparini F.Egidi J.Goings B.Peng A.Petrone T.Henderson D.Ranasinghe et al. Gaussian 16 Revision C.01 Gaussian Inc. Wallingford CT USA2016.
55. 10.1063/1.46491310.1063/1.464913 ↗
56. 10.1103/PhysRevB.37.78510.1103/PhysRevB.37.785 ↗
57. 10.1063/1.44879910.1063/1.448799 ↗
58. 10.1016/j.mee.2008.09.03910.1016/j.mee.2008.09.039 ↗
59. 10.1149/1.353483310.1149/1.3534833 ↗
60. 10.1002/adma.20100066310.1002/adma.201000663 ↗
61. 10.1016/j.mtadv.2020.10005610.1016/j.mtadv.2020.100056 ↗
62. 10.1038/srep0452210.1038/srep04522 ↗
63. 10.1038/s41467-018-05677-510.1038/s41467-018-05677-5 ↗
64. 10.1109/JPROC.2009.202107710.1109/JPROC.2009.2021077 ↗
65. 10.1007/s11664-021-08995-510.1007/s11664-021-08995-5 ↗
66. Gao B. · 2010 · 39210.1109/ESSDERC.2010.5618200 ↗
67. 10.1162/neco.1989.1.4.54110.1162/neco.1989.1.4.541 ↗
68. 10.1038/s41586-020-1942-410.1038/s41586-020-1942-4 ↗
69. 10.1166/jnn.2021.1892510.1166/jnn.2021.18925 ↗
70. Chen P. · 2017