Room‐Temperature, Low‐Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers
Source abstract
Abstract
A new UV-curable liquid resist based on cationic polymerization of silicone epoxies has been developed for UV-assisted nanoimprint lithography. Uniform films with thicknesses ranging from below 50 nm to over 1 μm can be easily spin-coated using a suitable undercoating layer on a substrate. Patterns with feature sizes ranging from tens of micrometers to 20 nm are imprinted at room temperature with a pressure of less than 0.1 MPa.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Advancements in Photolithography Techniques · Microfluidic and Capillary Electrophoresis Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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