journal article·2016-07

Extremely Large Gate Modulation in Vertical Graphene/WSe2 Heterojunction Barristor Based on a Novel Transport Mechanism

Jaewoo Shim, Hyo Seok Kim, Yoon Su Shim, Dong‐Ho Kang, Hyung‐Youl Park, Jaehyeong Lee, Jaeho Jeon, Seong Jun Jung, Young Jae Song, Woo‐Shik Jung, Jaeho Lee, Seongjun Park, Jeehwan Kim, Sungjoo Lee, Yong‐Hoon Kim, Jin‐Hong Park

Advanced Materials· Volume 28· Issue 26
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Abstract

A WSe2-based vertical graphene-transition metal dichalcogenide heterojunction barristor shows an unprecedented on-current increase with decreasing temperature and an extremely high on/off-current ratio of 5 × 107 at 180 K (3 × 104 at room temperature). These features originate from a trap-assisted tunneling process involving WSe2 defect states aligned near the graphene Dirac point. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Graphene research and applications · 2D Materials and Applications · MXene and MAX Phase Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Electronic and Electrical Engineering Sungkyunkwan University Suwon 440‐746 South Korea

Graduate School of Energy Environment, Water, and Sustainability Korea Advanced Institute of Science and Technology Daejeon 305‐701 South Korea

SKKU Advanced Institute of nanotechnology Sungkyunkwan University Suwon 440‐746 South Korea

Department of Electrical Engineering Stanford University California CA 94305 USA

Samsung Advanced Institute of Technology Samsung Electronics Co. Suwon 443‐803 South Korea

Department of Mechanical Engineering Massachusetts Institute of Technology Cambridge MA 02139 USA

Funding

Ministry of Science ICT and Future Planning

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