journal article·2013-12Open access

Photo–Roll Lithography (PRL) for Continuous and Scalable Patterning with Application in Flexible Electronics

Jong G. Ok, Moon Kyu Kwak, Chad M. Huard, Hong Seok Youn, L. Jay Guo

Advanced Materials· Volume 25· Issue 45

Abstract

A novel nanofabrication methodology for continuous, scalable, and geometry-tunable lithography is developed, named photo-roll lithography (PRL), by integrating photolithography with rollable processing. As a flexible mask attached to a quartz cylinder containing a UV source rolls over a photoresistcoated substrate, PRL realizes continuous photolithographic fabrication of various micro/nanoscale patterns with geometry that is tunable by controlling mask-substrate motions.
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Research context

OpenAlex topics: Nanofabrication and Lithography Techniques · Advanced Materials and Mechanics · Microfluidic and Bio-sensing Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Electrical Engineering and Computer Science University of Michigan Ann Arbor, Michigan 48109 USA

Department of Mechanical Engineering University of Michigan Ann Arbor, Michigan 48109 USA

School of Mechanical Engineering Kyungpook National University Daegu 702–701 South Korea

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