Induced Orientational Order in Symmetric Diblock Copolymer Thin Films
Source abstract
Abstract
A new polymer multilayer fabrication method that employs employing thin films of lamellar polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) is presented. The effectiveness of the technique is demonstrated by patterning nanometer-scale silicon wire arrays. A multilayer patterning process that features defect-free lamellar pattern formation is demonstrated (see figure).
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Block Copolymer Self-Assembly · Fluid Dynamics and Thin Films · Liquid Crystal Research Advancements
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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