journal article·2021-02Open access

A Library of Atomically Thin 2D Materials Featuring the Conductive‐Point Resistive Switching Phenomenon

Ruijing Ge, Xiaohan Wu, Liangbo Liang, Saban M. Hus, Yuqian Gu, Emmanuel Okogbue, Harry Chou, Jianping Shi, Yanfeng Zhang, Sanjay K. Banerjee, Yeonwoong Jung, Jack C. Lee, Deji Akinwande

Advanced Materials· Volume 33· Issue 7

Abstract

Abstract Non‐volatile resistive switching (NVRS) is a widely available effect in transitional metal oxides, colloquially known as memristors, and of broad interest for memory technology and neuromorphic computing. Until recently, NVRS was not known in other transitional metal dichalcogenides (TMDs), an important material class owing to their atomic thinness enabling the ultimate dimensional scaling. Here, various monolayer or few‐layer 2D materials are presented in the conventional vertical structure that exhibit NVRS, including TMDs (MX2, M = transitional metal, e.g., Mo, W, Re, Sn, or Pt; X = chalcogen, e.g., S, Se, or Te), TMD heterostructure (WS2/MoS2), and an atomically thin insulator (h‐BN). These results indicate the universality of the phenomenon in 2D non‐conductive materials, and feature low switching voltage, large ON/OFF ratio, and forming‐free characteristic. A dissociation–diffusion–adsorption model is proposed, attributing the enhanced conductance to metal atoms/ions adsorption into intrinsic vacancies, a conductive‐point mechanism supported by first‐principle calculations and scanning tunneling microscopy characterizations. The results motivate further research in the understanding and applications of defects in 2D materials.
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Research context

OpenAlex topics: Advanced Memory and Neural Computing · 2D Materials and Applications · MXene and MAX Phase Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Microelectronics Research Center The University of Texas at Austin Austin TX 78758 USA

Center for Nanophase Materials Sciences Oak Ridge National Laboratory Oak Ridge TN 37831 USA

Nanoscience Technology Center and Department of Electrical Engineering University of Central Florida Orlando FL 32826 USA

Department of Materials Science and Engineering College of Engineering Peking University Beijing 100871 China

The Institute for Advanced Studies Wuhan University Wuhan 430072 China

Department of Materials Science and Technology University of Central Florida Orlando FL 32816 USA

Funding

National Science Foundation · Army Research Office · U.S. Department of Energy · Oak Ridge National Laboratory · Office of Science · Korea Institute of Energy Technology Evaluation and Planning · Ministry of Trade, Industry and Energy · University of Central Florida · National Basic Research Program of China · National Natural Science Foundation of China

References (46)

Show source-provided references
1. 10.1021/acsnano.5b0555610.1021/acsnano.5b05556 ↗
2. 10.1016/j.eml.2017.01.00810.1016/j.eml.2017.01.008 ↗
3. 10.1016/j.mattod.2016.10.00210.1016/j.mattod.2016.10.002 ↗
4. 10.1038/s41565-017-0035-510.1038/s41565-017-0035-5 ↗
5. 10.1109/JPROC.2012.219036910.1109/JPROC.2012.2190369 ↗
6. 10.1021/acs.nanolett.7b0434210.1021/acs.nanolett.7b04342 ↗
7. 10.1039/C4CS00399C10.1039/C4CS00399C ↗
8. 10.1038/nmat413510.1038/nmat4135 ↗
9. 10.1002/adma.20160239110.1002/adma.201602391 ↗
10. 10.1002/adfm.20150418710.1002/adfm.201504187 ↗
11. 10.1038/nnano.2015.5610.1038/nnano.2015.56 ↗
12. Zhao L. · 2014
13. 10.1038/s41928-018-0118-910.1038/s41928-018-0118-9 ↗
14. 10.1002/adma.20170323210.1002/adma.201703232 ↗
15. 10.1002/adma.20180679010.1002/adma.201806790 ↗
16. Ge R. · 2018
17. 10.1038/s41467-018-04934-x10.1038/s41467-018-04934-x ↗
18. 10.1038/s41928-020-0416-x10.1038/s41928-020-0416-x ↗
19. 10.1021/acs.nanolett.8b0514010.1021/acs.nanolett.8b05140 ↗
20. 10.1038/natrevmats.2016.4210.1038/natrevmats.2016.42 ↗
21. 10.1002/aelm.20180014310.1002/aelm.201800143 ↗
22. 10.1002/adma.20160317410.1002/adma.201603174 ↗
23. 10.1038/nature1441710.1038/nature14417 ↗
24. 10.1021/acsami.9b0107810.1021/acsami.9b01078 ↗
25. 10.1021/nn301940k10.1021/nn301940k ↗
26. 10.1038/srep1994510.1038/srep19945 ↗
27. 10.1021/nn500760710.1021/nn5007607 ↗
28. 10.1038/s41598-017-01874-210.1038/s41598-017-01874-2 ↗
29. 10.1021/acs.nanolett.5b0091010.1021/acs.nanolett.5b00910 ↗
30. 10.1038/s41598-018-30969-710.1038/s41598-018-30969-7 ↗
31. 10.1016/j.apsusc.2017.04.24410.1016/j.apsusc.2017.04.244 ↗
32. 10.1038/s41467-020-15776-x10.1038/s41467-020-15776-x ↗
33. Chen A.
34. 10.1186/s11671-018-2619-x10.1186/s11671-018-2619-x ↗
35. 10.1109/LED.2016.257027910.1109/LED.2016.2570279 ↗
36. 10.1038/s41928-018-0021-410.1038/s41928-018-0021-4 ↗
37. 10.1002/bbpc.1980084081010.1002/bbpc.19800840810 ↗
38. 10.1186/1556-276X-7-55910.1186/1556-276X-7-559 ↗
39. 10.1021/acs.nanolett.5b0451310.1021/acs.nanolett.5b04513 ↗
40. 10.1103/PhysRevB.86.24540610.1103/PhysRevB.86.245406 ↗
41. 10.1038/s41565‐020‐00789‐w10.1038/s41565‐020‐00789‐w ↗
42. 10.1088/2053-1583/aa74a510.1088/2053-1583/aa74a5 ↗
43. 10.1021/acs.nanolett.7b0344910.1021/acs.nanolett.7b03449 ↗
44. 10.1016/j.carbon.2014.11.04010.1016/j.carbon.2014.11.040 ↗
45. 10.1016/0927-0256(96)00008-010.1016/0927-0256(96)00008-0 ↗
46. 10.1103/PhysRevLett.77.386510.1103/PhysRevLett.77.3865 ↗