journal article·2010-09

Nano‐tailoring the Surface Structure for the Monolithic High‐Performance Antireflection Polymer Film

Kiwoon Choi, Sung Ho Park, Young Min Song, Yong Tak Lee, Chang Kwon Hwangbo, Hoichang Yang, Han Sup Lee

Advanced Materials· Volume 22· Issue 33
Publisher page

Abstract

Nano-tailoring the shape and dimensions of the parabolic antireflective structure predicted by simulation has been successfully carried out to fabricate monolithic high-performance antireflection (AR) polymer films. The average total reflectivity from an artificial antireflection film is lowered down to 0.64% at a wavelength range of 400 nm to 800 nm, which appears to be the best antireflection performance ever reported for transparent polymer antireflection films. Detailed facts of importance to specialist readers are published as ”Supporting Information”. Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Optical Coatings and Gratings · Semiconductor materials and devices · Advanced Surface Polishing Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (34)

Show source-provided references
1. 10.1126/science.283.5401.52010.1126/science.283.5401.520 ↗
2. 10.1887/075030688210.1887/0750306882 ↗
3. 10.1364/AO.43.00128610.1364/AO.43.001286 ↗
4. 10.1063/1.305046310.1063/1.3050463 ↗
5. 10.1364/AO.42.00457310.1364/AO.42.004573 ↗
6. 10.1038/nphoton.2007.2610.1038/nphoton.2007.26 ↗
7. 10.1038/244281a010.1038/244281a0 ↗
8. 10.1021/nl080659j10.1021/nl080659j ↗
9. 10.1002/adma.20080276710.1002/adma.200802767 ↗
10. 10.1080/1040843060093043810.1080/10408430600930438 ↗
11. 10.1016/j.nantod.2010.03.00110.1016/j.nantod.2010.03.001 ↗
12. 10.1098/rspb.2005.336910.1098/rspb.2005.3369 ↗
13. 10.1063/1.303662910.1063/1.3036629 ↗
14. 10.1364/JOSA.71.00081110.1364/JOSA.71.000811 ↗
15. 10.1364/JOSAA.8.00054910.1364/JOSAA.8.000549 ↗
16. 10.1063/1.36891110.1063/1.368911 ↗
17. 10.1021/nl025758q10.1021/nl025758q ↗
18. 10.1063/1.299323110.1063/1.2993231 ↗
19. 10.1021/nl080842c10.1021/nl080842c ↗
20. 10.1126/science.268.5216.146610.1126/science.268.5216.1466 ↗
21. 10.1002/adma.20030525110.1002/adma.200305251 ↗
22. 10.1016/j.electacta.2007.09.01610.1016/j.electacta.2007.09.016 ↗
23. 10.1246/cl.2007.53010.1246/cl.2007.530 ↗
24. 10.1080/0950034960823287110.1080/09500349608232871 ↗
25. 10.1126/science.107121010.1126/science.1071210 ↗
26. 10.1021/nl060407n10.1021/nl060407n ↗
27. 10.1002/smll.20090021910.1002/smll.200900219 ↗
28. 10.1364/OE.17.02099110.1364/OE.17.020991 ↗
29. Zhu J. · Nano Lett. · 2010
30. 10.1063/1.339698010.1063/1.3396980 ↗
31. 10.1364/AO.45.00160810.1364/AO.45.001608 ↗
32. 10.1063/1.317193010.1063/1.3171930 ↗
33. 10.1038/376581a010.1038/376581a0 ↗
34. 10.1016/j.optmat.2006.07.01010.1016/j.optmat.2006.07.010 ↗