An In Situ Grazing Incidence X‐Ray Scattering Study of Block Copolymer Thin Films During Solvent Vapor Annealing
Source abstract
Abstract
In situ grazing-incidence small-angle X-ray scattering experiments on thin films of block copolymers during annealing in neutral solvent vapors are reported. By removing the solvent in a controlled manner, the period of the microphase separated morphology is found to increase with increasing block copolymer concentration in a power law manner with an exponent ∼ 2/3. By venting the systems at different rates during the solvent removal process, kinetically arresting the system, the period of the microphase separated morphology in the dried film can be varied. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Block Copolymer Self-Assembly · Advancements in Photolithography Techniques · Rheology and Fluid Dynamics Studies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Polymer Science and Engineering Department, University of Massachusetts at Amherst 120 Governors Drive Amherst MA 01003 USA
Advanced Light Source, Lawrence Berkeley National Laboratory 1 Cyclotron Road Berkeley CA 94720 USA
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